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US3067071A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor devices and methods of applying metal films thereto

Assignee: International Business Machines Corp
•
Filing: 1960-01-04
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Granted: 1962-12-04
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Expires: 1980-01-04
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Abstract

No abstract record available.

Inventors

  • 👤 Walter E Mutter

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-23 17:22
CPC Classifications
H; H10; H10P; H10P95/00; H10W; H10W74/00; H10W74/40; H10W74/43; Y; Y10; Y10T; Y10T428/00; Y10T428/12; Y10T428/12493; Y10T428/12528

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 169 words
THE METHOD OF MAKING AN ALLOY-JUNCTION SEMICONDUCTOR DEVICE COMPRISING: COATING A PORTION OF A SURFACE OF A SEMICONDUCTOR BODY OF A GIVEN CONDUCTIVITY TYPE WITH A METAL FILM WHICH IS OF THE OPPOSITE CONDUCTIVITY TYPE AND IS VOLATILE AT THE ALLOYING TEMPERATURE OF SAID BODY AND SAID FILM AND HAS A THICKNESS WITHIN THE RANGE OF 0.005 TO 1.0 MIL; EVAPORATING ON SAID FILM AND ON THE SURFACE OF SAID BODY ADJOINING SAID FILM, SO AS TO ENCLOSE SAID FILM COMPLETELY, A CONTINUOUS, COHERENT FILM OF SILICON MONOXIDE; AND HEATING SAID BODY AND SAID FILMS TO A TEMPERATURE AND FOR A PERIOD SUFFICIENT TO ALLOY SAID METAL FILM WITH SAID COATED PORTION OF SAID SURFACE OF SAID BODY AND TO FORM A PN JUNCTION WITHOUT CREATING DISCONTINUITIES IN THE ALLOYED PORTION, SAID SILICON MONOXIDE FILM BEING EFFECTIVE DURING SAID ALLOYING TO PREVENT THE ESCAPE OF SAID VOLATILE METAL AND THE FORMATION THEREBY ON THE UNCOATED SURFACE OF SAID BODY OF AN UNWANTED SEMICONDUCTOR SKIN OF SAID OPPOSITE CONDUCTIVITY TYPE.
Claim 2
Independent Claim 169 words
THE METHOD OF MAKING AN ALLOY-JUNCTION SEMICONDUCTOR DEVICE COMPRISING: COATING A PORTION OF A SURFACE OF A SEMICONDUCTOR BODY OF A GIVEN CONDUCTIVITY TYPE WITH A METAL FILM WHICH IS OF THE OPPOSITE CONDUCTIVITY TYPE AND IS VOLATILE AT THE ALLOYING TEMPERATURE OF SAID BODY AND SAID FILM AND HAS A THICKNESS WITHIN THE RANGE OF 0.005 TO 1.0 MIL; EVAPORATING ON SAID FILM AND ON THE SURFACE OF SAID BODY ADJOINING SAID FILM, SO AS TO ENCLOSE SAID FILM COMPLETELY, A CONTINUOUS, COHERENT FILM OF SILICON MONOXIDE; AND HEATING SAID BODY AND SAID FILMS TO A TEMPERATURE AND FOR A PERIOD SUFFICIENT TO ALLOY SAID METAL FILM WITH SAID COATED PORTION OF SAID SURFACE OF SAID BODY AND TO FORM A PN JUNCTION WITHOUT CREATING DISCONTINUITIES IN THE ALLOYED PORTION, SAID SILICON MONOXIDE FILM BEING EFFECTIVE DURING SAID ALLOYING TO PREVENT THE ESCAPE OF SAID VOLATILE METAL AND THE FORMATION THEREBY ON THE UNCOATED SURFACE OF SAID BODY OF AN UNWANTED SEMICONDUCTOR SKIN OF SAID OPPOSITE CONDUCTIVITY TYPE.

References Cited (Backward Citations)

US2785095A Cited
US2844770A Cited
US2931743A Cited
US2887633A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1965-12-03 1966-06-04 1966-12-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1969-12-03 1970-06-04 1970-12-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1973-12-03 1974-06-04 1974-12-04 $7700.00 Window Closed / Lapsed

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