US2920002A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for the manufacture of thin films
Assignee: Individual
•
Filing: 1953-06-19
•
Granted: 1960-01-05
•
Expires: 1973-06-19
Abstract
No abstract record available.
Inventors
- 👤 Auwarter Max
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 04:14
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/245; H; H01; H01B; H01B1/00; C03C2217/00; C03C2217/20; C03C2217/21; C03C2217/229; C03C2218/00; C03C2218/10; C03C2218/15; C03C2218/152; Y; Y10; Y10S; Y10S148/00; Y10S148/052
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
136 words
PROCESS FOR THE DEPOSITION OF MECHANICALLY AND CHEMICALLY RESISTANT, SUBSTANTIALLY ABSORPTION-FREE LIGHT TRANSPARENT THIN FLIMS COMPOSED SUBSTANTIALLY COMPLETELY OF A SATURATED METALLIC COMPOUND ON A CARRIER, WHICH COMPRISES ENRICHING THE ATMOSPHERE OF A VAPORIZATION CHAMBER WITH A REACTIVE GAS IN CONTAINED IN SUBSTANTIALLY WITH THE FREE METAL AT THE TEMPERATURE OF VAPORIZATION WHEREBY SAID REACTIVE GAS IS CONTAINED IN SUBSTANTIALLY HIGHER PROPORTION THAN IN THE NORMAL ATMOSPHERE, VAPORIZING AT LEAST A SUBSTANCE SELECTED FROM THE GROUP CONSISTING OF (1) A VAPORIZABLE METAL ADAPTED TO FORM A SATURATED COMPOUND THE THIN FLIM OF WHICH IS MECHANICALLY AND CHEMICALLY RESISTANT, SUBSTANTIALLY, ABSORPTIONFREE AND LIGHT-TRANSPARENT, (2) A VAPORIZABLE COMPOUND OF SUCH METAL, AND (3) A MIXTURE OF SUCH COMPOUND WITH THE FREE METAL, IN THE ENRICHED ATMOSPHERE AND UNDER A REDUCED PRESSURE BELOW THAT WHICH LEADS TO A SUBSTAN-
Claim 2
Dependent Claim
136 words
PROCESS FOR THE DEPOSITION OF MECHANICALLY AND CHEMICALLY RESISTANT, SUBSTANTIALLY ABSORPTION-FREE LIGHT TRANSPARENT THIN FLIMS COMPOSED SUBSTANTIALLY COMPLETELY OF A SATURATED METALLIC COMPOUND ON A CARRIER, WHICH COMPRISES ENRICHING THE ATMOSPHERE OF A VAPORIZATION CHAMBER WITH A REACTIVE GAS IN CONTAINED IN SUBSTANTIALLY WITH THE FREE METAL AT THE TEMPERATURE OF VAPORIZATION WHEREBY SAID REACTIVE GAS IS CONTAINED IN SUBSTANTIALLY HIGHER PROPORTION THAN IN THE NORMAL ATMOSPHERE, VAPORIZING AT LEAST A SUBSTANCE SELECTED FROM THE GROUP CONSISTING OF (1) A VAPORIZABLE METAL ADAPTED TO FORM A SATURATED COMPOUND THE THIN FLIM OF WHICH IS MECHANICALLY AND CHEMICALLY RESISTANT, SUBSTANTIALLY, ABSORPTIONFREE AND LIGHT-TRANSPARENT, (2) A VAPORIZABLE COMPOUND OF SUCH METAL, AND (3) A MIXTURE OF SUCH COMPOUND WITH THE FREE METAL, IN THE ENRICHED ATMOSPHERE AND UNDER A REDUCED PRESSURE BELOW THAT WHICH LEADS TO A SUBSTAN-
References Cited (Backward Citations)
US2077442A
Cited
US2411715A
Cited
US2411955A
Cited
US2430452A
Cited
US2466119A
Cited
US2440105A
Cited
US2450850A
Cited
US2478385A
Cited
US2549926A
Cited
US2578956A
Cited
US2539149A
Cited
US2784115A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1963-01-04 | 1963-07-06 | 1964-01-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1967-01-04 | 1967-07-06 | 1968-01-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1971-01-04 | 1971-07-06 | 1972-01-05 | $7700.00 | Window Closed / Lapsed |