Amorphous carbon material

Abstract

Abstract PURPOSE:To prepare an amorphous carbon material having light-emitting and semiconductive characteristics and high hardness, by decomposing a hydrocarbon material in a vacuum vessel with a plasma generated by the action of RF high frequency electrical field, thereby depositing the produced carbon. CONSTITUTION:A hydrocarbon material of methane-, ethylene- or acetylene- series is converted to plasma in a vacuum vessel by the action of RF high frequency electrical field, and is decomposed and deposited to a silicon substrate or a slide glass plate by the action of the plasma. The obtained thin-film is a light- yellow transparent substance composed of carbon material having amorphous structure to which hydrogen is firmly bonded, based on the X-ray diffraction and IR absorption spectrum. The carbon material has a light-emitting characteristic having a peak at about 2.6eV, a semiconductive characteristic having an optical gap of about 3.0eV, and a hardness harder than a carbide tool and comparable to diamond.

Inventors

• 👤 Yukio Ichinose
• 👤 一ノ瀬　幸雄
• 👤 Fusao Shimokawa
• 👤 房男 下川

Bibliographic Details