Forming device for minute pattern

Abstract

Abstract PURPOSE:To form the mask pattern directly without the application of a resist and the process of development by positioning a gas containing carbon near the forming section of the pattern when exposure and directly fixing the gas component to the surface to be processed by electron beams. CONSTITUTION:When the electron beams 6 are irradiated only to a specified section on a material to be processed in form that the predetermined pattern is drawn by an electrooptic system, the gas 10 containing carbon blown from a nozzle 7 is positioned around the material to be processed 4, and a condition that the gas collides with the surface to be processed at all times thermal agitation is brought. If electron rays are projected when the carbon gas collides with the solid surface, carbon gas molecules are baked to the solid surface and solidified through the reception of the energy of the electron rays. The carbon compounds 11 are grown in the extent which can be used as the mask patterns.

Inventors

• 👤 Takayuki Matsukawa
• 👤 隆行 松川
• 👤 Hideaki Arima
• 👤 有馬　秀明

Bibliographic Details