Repair of defect on photomask

Abstract

Abstract PURPOSE:To repair pinhole by applying and sintering an unsoluble and nonlight transmitting material as repairing material on defect by heat. CONSTITUTION:A metal thin film 3 and a photoresist 7 are applied on a transparent glass substrate 1 and undergo exposure, development and etching to form a desired pattern with the result that pinholes 8 and black spots 9 are generated. The black spot 9 is evaporated away by irradiating a laser beam. Then, for example, a repairing material 10 made up of a powdered carbon dissolved in an albumin is applied on a substrate on which a metal thin film pattern is formed and a laser beam is irradiated on the pinhole 8 and sinters the repairing material on the pinhole by heat. Other part thereof is removed by development. This enables the accurate filling of small defects such as pinhole thereby enabling the repairing thereof.

Inventors

• 👤 Kazuhiro Tanaka

Bibliographic Details