GB1117009A
Expired / Lapsed
GB
⏱️ 0.0 years remaining
Improvements in and relating to depositing thin layers by vapour deposition or cathode sputtering
Assignee: Balzers Patent und Beteiligungs AG
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Filing: 1965-10-04
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Granted: —
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Expires: 1985-10-04
Abstract
Abstract The atmosphere during an evaporation or sputtering deposition process in which more than one layer is deposited is changed progressively during the deposition process. In examples (a) copper, aluminium or chromium oxide is deposited in oxygen and the partial pressure of the oxygen is reduced to give a further coating of copper, aluminium or chromium (b) layers of titanium oxide and nitride are formed by changing the atmosphere from oxygen to nitrogen. The substrate may be heated during or after deposition and may be glass or synthetic substances.
Inventors
No inventors recorded.
Bibliographic Details
Application Number
—
Jurisdiction
GB
Data Source
google_patents
Last Synchronized
2026-10-22 17:04
CPC Classifications
G; G02; G02B; G02B1/00; G02B1/10; G02B1/16; B; B23; B23K; B23K35/00; B23K35/001; C; C03; C03C; C03C17/00; C03C17/34; C03C17/36; C03C17/3602; C03C17/3618; C03C17/3639; C03C17/3644; C03C17/3649; C03C17/3655; C03C17/40; C03C27/00; C03C27/04; C03C27/042; C03C27/046; C04; C04B; C04B41/00; C04B41/009; C04B41/45; C04B41/52; C04B41/80; C04B41/81; C04B41/89; C23; C23C; C23C14/00; C23C14/0021; C23C14/0036; C23C14/0084; C23C14/06; C23C14/08; C23C14/14; C23C14/18; H; H01; H01B; H01B1/00; H01J; H01J37/00; H01J37/32; H01J37/34; H01H; H01H33/00; H01H33/60; H01H33/66; H01H33/662; H01H33/66207; H01H2033/66215
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