Electrophotographic method using amorphous silicon photosensitive material
Abstract
Abstract More than 100,000 pieces of copies are obtained by maintaining the atmosphere for the photosensitive material, effecting the developing and polishing the surface of the photosensitive material by cleaning in a manner that the degree of oxidation in the surface of the amorphous silicon photosensitive material (SiO/SiC)x and the amount of deposition of the discharge products (mol/cm 2 )y satisfy the relation (1) x ≦ 30 and the relation (2) y ≦ 2.2 x 10 -9 · exp(-2.0x) According to this method, the image is prevented from flowing without permitting the life of the photosensitive material to decrease, and the image can be stably formed for extended periods of time.
Inventors
- 👤 Hiroyuki C/O Mita Industrial Co. Ltd. Hazama
- 👤 Masahiro C/O Mita Industrial Co. Ltd. Tsutsumi
- 👤 Masaru C/O Mita Industrial Co. Ltd. Watanabe
Bibliographic Details
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