EP0406691A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Process for continuously forming a large area functional deposited film by microwave PCVD method and an apparatus suitable for practicing the same
Assignee: Canon Inc
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Filing: 1990-06-27
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Granted: —
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Expires: 2010-06-27
Abstract
Abstract method for continuously forming a large area functional deposited film by a microwave plasma CVD process, said method comprises: continuously moving a substrate web in the longitudinal direction; establishing a substantially enclosed film-forming chamber having a film-forming space by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving; introducing a film-forming raw material gas through a gas feed means into said film-forming space; at the same time, radiating or propagating microwave energy into said film-forming space by using a microwave applicator means capable of radiating or propagating said microwave energy with a directivity in one direction of microwave energy to propagate to generate microwave plasma in said film-forming space, whereby continuously forming a functional deposited film on the inner face of said continuously moving circumferential wall to be exposed to said microwave plasma. An apparatus suitable for practicing said method.
Inventors
- 👤 Masahiro Kanai
- 👤 Jinsho Matsuyama
- 👤 Katsumi Nakagawa
- 👤 Toshimitsu Kariya
- 👤 Yasushi Fujioka
- 👤 Tetsuya Takei
- 👤 Hiroshi Echizen
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-23 13:20
CPC Classifications
H; H10; H10F; H10F10/00; H10F10/10; H10F10/17; H10F10/172; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/54; C23C16/545; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; H01J37/32211; H01J37/3222; H01J37/32431; H01J37/32733; H01J37/32752; H01J37/32761; H01J37/3277; H10F71/00; H10F71/10; H10F71/107; H01J2237/00; H01J2237/32; H01J2237/33; H01J2237/332; H01J2237/3322; H01J2237/3325; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/548; Y02P; Y02P70/00; Y02P70/50
Claims Analysis
Total Claims: 34
Claim 1
Independent Claim
151 words
A method for continuously forming a large area functional deposited film by a microwave plasma CVD process, said method comprises: continuously moving a substrate web in the longitudinal direction; establishing a substantially enclosed film-forming chamber having a film-forming space by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving; introducing a film-forming raw material gas through a gas feed means into said film-forming space; at the same time, radiating or propagating microwave energy into said film-forming space by using a microwave applicator means capable of radiating or propagating said microwave energy with a directivity in one direction of microwave energy to propagate to generate microwave plasma in said film-forming space, whereby continuously forming a functional deposited film on the inner face of said continuously moving circumferential wall to be exposed to said microwave plasma.
Claim 2
Independent Claim
151 words
A method for continuously forming a large area functional deposited film by a microwave plasma CVD process, said method comprises: continuously moving a substrate web in the longitudinal direction; establishing a substantially enclosed film-forming chamber having a film-forming space by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving; introducing a film-forming raw material gas through a gas feed means into said film-forming space; at the same time, radiating or propagating microwave energy into said film-forming space by using a microwave applicator means capable of radiating or propagating said microwave energy with a directivity in one direction of microwave energy to propagate to generate microwave plasma in said film-forming space, whereby continuously forming a functional deposited film on the inner face of said continuously moving circumferential wall to be exposed to said microwave plasma.
Claim 3
Dependent Claim
41 words
The method according to claim 1, wherein the film-forming chamber is configured such that does not permit microwave energy radiated or propagated into the film- forming space to leak outside said chamber-and microwave plasma generated is confined within the film-forming space.
Claim 4
Dependent Claim
31 words
The method according to claim 1, wherein each of the two side faces of the columnar portion is sealed by a member capable of prohibiting microwave energy to be leaked therefrom.
Claim 5
Dependent Claim
64 words
The method according to claim 1, wherein the columnar portion is formed by supportingly curving the moving substrate web by means of a pair of supportingly transporting rollers while leaving a spacing of a desired width in the longitudinal direction between said pair of rollers and each of the two side end portion of the columnar portion is supported by a supportingly transporting ring.
Claim 6
Dependent Claim
31 words
The method according to claim 4, wherein each of the two side faces of the columnar portion is sealed by a member capable of prohibiting microwave energy to be leaked therefrom.
Claim 7
Dependent Claim
33 words
The method according to claim 4, wherein the microwave energy is radiated or propagated through the spacing into the film-forming space by the microwave applicator means being arranged in vicinity to the spacing.
Claim 8
Dependent Claim
23 words
The method according to claim 6, wherein the microwave applicator means is encapsuled in an isolating means made of a microwave transmissive material.
Claim 9
Dependent Claim
27 words
The method according to claim 1, wherein the microwave applicator means is arranged in the film-forming space in parallel to the circumferential wall of the film-forming chamber.
Claim 10
Dependent Claim
23 words
The method according to claim 8, wherein the microwave applicator means is encapsuled in an isolating means made of a microwave transmissive material.
Claim 11
Dependent Claim
17 words
The method according to claim 1, wherein the film-forming space is maintained at a desired gas pressure.
Claim 12
Dependent Claim
17 words
The method according to claim 4, wherein gas in the film-forming space is exhausted through the spacing.
Claim 13
Dependent Claim
20 words
The method according to claim 1, wherein the inner surface of the columnar portion is maintained at a desired temperature.
Claim 14
Dependent Claim
28 words
The method according to claim 1, wherein a temperature controlling mechanism capable of heating or cooling the substrate web is arranged near the exterior of the columnar portion.
Claim 15
Dependent Claim
19 words
The method according to claim 1 which further comprises the step of controlling the potential of the microwave plasma.
Claim 16
Dependent Claim
32 words
The method according to claim 14, wherein the step of controlling the potential of the microwave plasma is carried out by using a bias voltage applying means isolated from the substrate web.
Claim 17
Dependent Claim
33 words
The method according to claim 15, wherein said bias voltage applying means is placed in the film-forming space such that at least part of said means comes to contact with microwave plasma generated.
Claim 18
Dependent Claim
24 words
The method according to claim 16, wherein a bias voltage of DC, AC or pulsating current is applied onto the bias voltage applying means.
Claim 19
Dependent Claim
19 words
The method according to claim 15, wherein the bias voltage applying means serves also as the gas feed means.
Claim 20
Dependent Claim
18 words
The method according to claim 15, wherein the bias voltage applying means comprises one or more bias bars.
Claim 21
Dependent Claim
28 words
The method according to claim 14, wherein the step of controlling the potential of microwave plasma is carried out by applying a bias voltage onto the substrate web.
Claim 22
Dependent Claim
36 words
The method according to claim 20, wherein the gas feed means is electrically grounded and is placed in the film-forming space such that at least part of said means comes to contact with microwave plasma generated.
Claim 23
Independent Claim
153 words
A method for continuously forming a large area functional deposited film by a microwave plasma CVD process, said method comprises: continuously moving a substrate web in the longitudinal direction; establishing a substantially enclosed film-forming chamber having a film-forming space by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving; introducing a film-forming raw material gas through a gas feed means into said film-forming space; at the same time, radiating or propagating evanescent microwave energy into said film-forming space by using a microwave applicator means capable of radiating or propagating said microwave energy with a directivity in one direction of evanescent microwave energy to propagate to generate microwave plasma in said film-forming space, whereby continuously forming a functional deposited film on the inner face of said continuously moving circumferential wall to be exposed to said microwave plasma.
Claim 24
Independent Claim
153 words
A method for continuously forming a large area functional deposited film by a microwave plasma CVD process, said method comprises: continuously moving a substrate web in the longitudinal direction; establishing a substantially enclosed film-forming chamber having a film-forming space by curving and projecting said moving substrate web to form a columnar portion to be the circumferential wall of said film forming chamber on the way moving; introducing a film-forming raw material gas through a gas feed means into said film-forming space; at the same time, radiating or propagating evanescent microwave energy into said film-forming space by using a microwave applicator means capable of radiating or propagating said microwave energy with a directivity in one direction of evanescent microwave energy to propagate to generate microwave plasma in said film-forming space, whereby continuously forming a functional deposited film on the inner face of said continuously moving circumferential wall to be exposed to said microwave plasma.
Claim 25
Dependent Claim
204 words
A microwave plasma CVD apparatus suitable for continuously forming a large area and lengthy functional deposited film, said apparatus comprises: a substrantially enclosed columnar film-forming chamber having a curved circumferential wall formed by curving and projecting a substrate web on the way moving in the longitudinal direction from a pay-out mechanism to a take-up mechanism by a pair of rollers for supportingly curving said substrate web, said film-forming chamber having a film-forming space, said pair of rollers being arranged in parallel to each other while leaving a predetermined spacing between them in the longitudinal direction; a pair of rotary rings capable of supportingly transporting said substrate web, each of said pair of rotary rings being arranged to support one of the side end portion so as to maintain the columnar shape of said curved circumferential wall; a microwave applicator means encapsuled in a isolating means made of a microwave transmissive material, said microwave applicator means being capable of radiating or propagating microwave energy with a directivity in one direction of microwave energy to propagate; means for evacuating the inside of said film-forming chamber; means for introducing a film-forming raw material gas into said film-forming chamber; and means for heating or cooling said substrate web.
Claim 26
Dependent Claim
204 words
A microwave plasma CVD apparatus suitable for continuously forming a large area and lengthy functional deposited film, said apparatus comprises: a substrantially enclosed columnar film-forming chamber having a curved circumferential wall formed by curving and projecting a substrate web on the way moving in the longitudinal direction from a pay-out mechanism to a take-up mechanism by a pair of rollers for supportingly curving said substrate web, said film-forming chamber having a film-forming space, said pair of rollers being arranged in parallel to each other while leaving a predetermined spacing between them in the longitudinal direction; a pair of rotary rings capable of supportingly transporting said substrate web, each of said pair of rotary rings being arranged to support one of the side end portion so as to maintain the columnar shape of said curved circumferential wall; a microwave applicator means encapsuled in a isolating means made of a microwave transmissive material, said microwave applicator means being capable of radiating or propagating microwave energy with a directivity in one direction of microwave energy to propagate; means for evacuating the inside of said film-forming chamber; means for introducing a film-forming raw material gas into said film-forming chamber; and means for heating or cooling said substrate web.
Claim 27
Dependent Claim
19 words
The apparatus according to claim 23 which further comprises means for applying a bias voltage into the film-forming chamber.
Claim 28
Dependent Claim
29 words
The apparatus according to claim 23, wherein the microwave applicator means is arranged in the film-forming space in parallel to the curved circumferential wall in the width direction thereof.
Claim 29
Dependent Claim
19 words
The apparatus according to claim 25 which further comprises means for applying a bias voltage into the film-forming chamber.
Claim 30
Dependent Claim
25 words
The apparatus according to claim 23, wherein the microwave applicator means is arranged under the pair of the rollers and in vicinity to the spacing.
Claim 31
Dependent Claim
19 words
The apparatus according to claim 27 which further comprises means for applying a bias voltage into the film-forming chamber.
Claim 32
Dependent Claim
205 words
A microwave plasma CVD apparatus suitable for continuously forming a large area and lengthy functional deposited film, said apparatus comprises: a substantiall enclosed columnar film-forming chamber having a curved circumferential wall formed by curving and projecting a substrate web on the way moving in the longitudinal direction from a pay-out mechanism to a take up mechanism by a pair of rollers for supportingly curving said substrate web, said film-forming chamber having a film-forming space, said pair of rollers being arranged in parallel to each other while leaving a predetermined spacing between them in the longitudinal direction; a pair of rotary rings capable of supportingly transporting said substrate web, each of said pair of rotary rings being arranged to support one of the side end portion so as to maintain the columnar shape of said curved circumferential wall; a microwave applicator means encapsuled in a isolating means made of a microwave transmissive material, said microwave applicator means being capable of radiating or propagating evanescent microwave with a directivity in one direction of evanescent microwave to propagate; means for evacuating the inside of said film-forming chamber; means for introducing a film-forming raw material gas into said film-forming chamber; and means for heating or cooling said substrate web.
Claim 33
Dependent Claim
205 words
A microwave plasma CVD apparatus suitable for continuously forming a large area and lengthy functional deposited film, said apparatus comprises: a substantiall enclosed columnar film-forming chamber having a curved circumferential wall formed by curving and projecting a substrate web on the way moving in the longitudinal direction from a pay-out mechanism to a take up mechanism by a pair of rollers for supportingly curving said substrate web, said film-forming chamber having a film-forming space, said pair of rollers being arranged in parallel to each other while leaving a predetermined spacing between them in the longitudinal direction; a pair of rotary rings capable of supportingly transporting said substrate web, each of said pair of rotary rings being arranged to support one of the side end portion so as to maintain the columnar shape of said curved circumferential wall; a microwave applicator means encapsuled in a isolating means made of a microwave transmissive material, said microwave applicator means being capable of radiating or propagating evanescent microwave with a directivity in one direction of evanescent microwave to propagate; means for evacuating the inside of said film-forming chamber; means for introducing a film-forming raw material gas into said film-forming chamber; and means for heating or cooling said substrate web.
Claim 34
Dependent Claim
19 words
The apparatus according to claim 29 which further comprises means for applying a bias voltage into the film-forming chamber.
References Cited (Backward Citations)
No citation records indexed.
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