EP0095172A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Chemical etching method
Assignee: Kangyo Denkikiki KK
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Filing: 1983-05-21
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Granted: —
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Expires: 2003-05-21
Abstract
Abstract A member (12) to be etched is subjected to etching through a mask layer (13) of a predetermined pattern and that portion of the mask layer (13) overhanging a side-etched portion resulting from the etching is bent down to be jointed by an adhesive binder (33) to the side wall of the side-etched portion to form a first etching-resistant layer (18). Then the member (12) to be etched is subjected again to etching using the first etching-resistant layer (18) and the mask layer (13) as an etching mask.
Inventors
- 👤 Michio Sudo
- 👤 Hitoshi Miura
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-23 05:02
CPC Classifications
H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/061; C; C23; C23F; C23F1/00; C23F1/02; G; G03; G03F; G03F7/00; G03F7/26; G03F7/40; H05K2201/00; H05K2201/01; H05K2201/0137; H05K2201/0166; H05K2203/00; H05K2203/03; H05K2203/0369; H05K2203/05; H05K2203/0562; H05K2203/0597
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
164 words
A chemical etching method which comprises a mask layer forming step for forming an etching-resistant mask layer (13) of a predetermined pattern on a member (12) to be etched, first etching step for subjecting said member to chemical etching through using said mask layer as an etching mask a bending step in which that portion of said mask layer projecting from said member as a result of side etching of the portion of said member underlying said mask layer in said first etching step is bent down to form a first etching-resistant layer (18) on the side wall of the side-etched portion, and a second etching step for subjecting said member (12) to chemical etching through using said mask layer (13) and said first etching-resisting layer (18) as an etching mask after said bending step, characterized in that said bending step is a joining step for joining said first etching-resisting layer to the side wall of the side-etched portion through using an adhesive binder.
Claim 2
Dependent Claim
164 words
A chemical etching method which comprises a mask layer forming step for forming an etching-resistant mask layer (13) of a predetermined pattern on a member (12) to be etched, first etching step for subjecting said member to chemical etching through using said mask layer as an etching mask a bending step in which that portion of said mask layer projecting from said member as a result of side etching of the portion of said member underlying said mask layer in said first etching step is bent down to form a first etching-resistant layer (18) on the side wall of the side-etched portion, and a second etching step for subjecting said member (12) to chemical etching through using said mask layer (13) and said first etching-resisting layer (18) as an etching mask after said bending step, characterized in that said bending step is a joining step for joining said first etching-resisting layer to the side wall of the side-etched portion through using an adhesive binder.
Claim 3
Dependent Claim
119 words
A chemical etching method according to claim 1 wherein said joining step comprises an adhesive binder solution applying step for sufficiently supplying an adhesive binder solution to respective parts of said member (12) including said side-etched portion after said first etching step and a heat-drying step in which said member covered with the adhesive binder solution is dried by heating and the overhanging portion of said mask layer is bent down by the surface tension of the adhesive binder solution to be deposited on the side wall of said side-etched portion and, then, the adhesive binder between said first etching-resistant layer (18) and the side wall of said side-etched portion is hardened to form a second etching-resistant layer (33).
Claim 4
Dependent Claim
27 words
A chemical etching method according to claim 2 wherein said adhesive binder solution applying step is a step for dipping said member into the adhesive binder solution.
Claim 5
Dependent Claim
27 words
A chemical etching method according to claim 2 wherein said adhesive binder solution applying step is a step for spraying the adhesive binder solution to said member.
Claim 6
Dependent Claim
36 words
A chemical etching method according to any of claims 2 to 4 wherein said adhesive binder solution applying step is preceded by a washing step for washing away an etchant used in said first etching step.
Claim 7
Dependent Claim
36 words
A chemical etching method according to claim 5 wherein a drying step for drying, by heating, a cleaning solution used in said washing step follows said washing step and precedes said adhesive binder solution applying step.
Claim 8
Dependent Claim
27 words
A chemical etching method according to any of claims 2 to 6 wherein the adhesive binder solution is an aqueous solution of glycol and an organic acid.
Claim 9
Dependent Claim
54 words
A chemical etching method according to claim 7 wherein the blending ratio of the glycol and the organic acid is in the range from a 15 mol% excess of the total number of OH groups of the glycol to a 10 mol% excess of the total number of COOH groups of the organic acid.
Claim 10
Dependent Claim
38 words
A chemical etching method according to claim 8 wherein the total number of the OH groups of the glycol and the total number of the COOH groups of the organic acid are selected substantially equal to each other.
Claim 11
Dependent Claim
35 words
A chemical etching method according to any of claims 2 to 9 wherein the concentration of the adhesive binder components to the adhesive binder solution is in the range from 0.15 to 1.05% in weight.
Claim 12
Dependent Claim
31 words
A chemical etching method according to claim 10 wherein the concentration of the adhesive binder components to the adhesive binder solution is in the range from 0.4 to 1.0% in weight.
Claim 13
Dependent Claim
36 words
A chemical etching method according to any of claims 2 to 11 including a step for repeating at least once said first etching step, said joining step and said second etching step in a sequential order.
Claim 14
Dependent Claim
36 words
A chemical etching method according to any of claims 2 to 12 wherein said first etching step is carried out until the etching depth reaches about two thirds the thickness of said member to be etched.
References Cited (Backward Citations)
No citation records indexed.
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